Abstract

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This document specifies the test method for measuring the crystalline quality of single-crystal thin film (wafer) using the XRD method with parallel X-ray beam. This document is applicable to all of the single-crystal thin film (wafer) as bulk or epitaxial layer structure.


General information 

  • Status
     : Published
    Publication date
     : 2020-08
  • Edition
     : 1
    Number of pages
     : 29
  • Technical Committee
     : ISO/TC 206 Fine ceramics
  • ICS
     :
    81.060.30 Advanced ceramics

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This standard contributes to the following Sustainable Development Goal

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