Abstract
This document provides guidelines for measuring the sputtered depth in sputtered depth profiling.
The methods of sputtered depth measurement described in this document are applicable to techniques of surface chemical analysis when used in combination with ion bombardment for the removal of a part of a solid sample to a typical sputtered depth of up to several micrometres. The depth typically determined by this approach is between 1 nm to 500 µm.
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General information
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Status: PublishedPublication date: 2021-03Stage: International Standard published [60.60]
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Edition: 2Number of pages: 13
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Technical Committee :ISO/TC 201/SC 4ICS :71.040.40
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Life cycle
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Previously
WithdrawnISO/TR 15969:2001
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